On Thursday, 1 October 1992 20:58:41 UTC+1, Ermanno Borra  wrote:   
   > I wonder whether somebody can suggest solutions to my   
   > problem. I pour either liquid gallium or a Ga-In eutectic in a container,   
   > and find that the surface (several feet across) is covered with a thick   
   > layer of oxide scum.  The problem occurs during stirring, that occurs   
   > just when I pour Ga After pouring, I do not stir the liquid again.   
   >  I would like to get rid of the opaque oxide scum and get a shiny   
   > optical quality surface. Although it is in principle possible to work in   
   > an inert atmosphere and avoid the oxide, it is difficult to do so in   
   > practice, because of our setup. I know that, in an oxygen atmosphere,   
   > an oxide layer forms instantly but this is OK since the oxide layer that   
   > forms on an undisturbed surface is very thin and protects the Ga   
   > below from oxidation (like it does with Al). My real problem occurs at   
   > the moment of pouring since the liquid is stirred and we get too much   
   > thick messy oxide. Ideally, I would like to remove the oxide with   
   > chemical means, get a clean Ga surface that can be oxidized with the   
   > very thin layer of oxide that naturally forms on an undisturbed   
   > surface.   
   > I have tried to expose the oxide to HCl vapors. The surface becomes   
   > more reflective but its quality is not good enough for my application   
   > (using it as a an optical mirror).   
   > 	   
   > If you have a suggestion, please email at borra@phy.ulaval.ca   
   >   
   > 				  Thanks,   
   > E.F. Borra   
      
   Gallium oxide + HCl -> gallium trichloride + water   
      
   Gallium trichloride is soluble in water, so it can be washed away along with   
   any excess HCl. You can do this with the EGaIn as a solid or a liquid, though   
   probably easier as a solid.   
      
   --- SoupGate-Win32 v1.05   
    * Origin: you cannot sedate... all the things you hate (1:229/2)